POSITION DETECTION DEVICE AND VAPOR DEPOSITION APPARATUS

Provided are a position detection device and a vapor deposition apparatus to improve detection accuracy with respect to a position of a substrate. The position detection device (1) comprises: a photographing unit (11) photographing a first image by light reflected from a flat portion (Wp1) of a subs...

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Bibliographische Detailangaben
Hauptverfasser:	BANNAI YUYA, YANAGIHORI FUMITSUGU, YOSHIDA YUICHI, OGAWA KEI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CALCULATING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPUTING COUNTING DIFFUSION TREATMENT OF METALLIC MATERIAL IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Provided are a position detection device and a vapor deposition apparatus to improve detection accuracy with respect to a position of a substrate. The position detection device (1) comprises: a photographing unit (11) photographing a first image by light reflected from a flat portion (Wp1) of a substrate (W) and a second image by light reflected from a bevel portion (Wp2) connected to the flat portion (Wp1); and an image processing unit (12) extracting a boundary of the flat portion (Wp1) and the bevel portion (Wp2) based on a contrast of the first image and the second image as a part of appearance of the substrate (W), and specifying a position of the substrate (W) from the extracted part of the appearance. 기판의 위치에 대하여 검출 정밀도를 향상시킬 수 있도록 한 위치검출장치 및 증착장치가 제공된다. 위치검출장치(10)는 기판(W)의 평탄부(Wp1)에서 반사된 광에 의한 제1 상과, 평탄부(Wp1)로 연결되는 베벨부(Wp2)에서 반사된 광에 의한 제2 상을 촬영하는 촬영부(11)와, 제1 상과 제2 상의 콘트라스트에 기초하는 평탄부(Wp1)와 베벨부(Wp2)의 경계를 기판(W)의 외형의 일부로서 추출하고, 그 추출된 외형의 일부로부터 기판(W)의 위치를 특정하는 화상처리부(12)를 구비한다.