Target for physical vapor deposition nano composite coating layer using the same and method of fabricating thereof

The present invention provides a target for physical vapor deposition, the target being formed of a Zr-Cu-Si based alloy in order to form a low-friction coating film, wherein the target comprises 82-90 at% of Zr, 4-14 at% of Cu, and 4-8 at% of Si. 본 발명은 저마찰 코팅막을 형성하기 위하여 Zr-Cu-Si계 합금으로 이루어진 물리증착 타겟으...

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Bibliographische Detailangaben
Hauptverfasser:	JUNG HUN, YOON HAE WON, BANG GYUNG BAE, MOON KYOUNG IL, LEE HAN CHAN, KIM TAE HWAN, PARK HYUN JUN, OH SE PIL, SHIN SEUNG YONG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ALLOYS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Beschreibung
Zusammenfassung:	The present invention provides a target for physical vapor deposition, the target being formed of a Zr-Cu-Si based alloy in order to form a low-friction coating film, wherein the target comprises 82-90 at% of Zr, 4-14 at% of Cu, and 4-8 at% of Si. 본 발명은 저마찰 코팅막을 형성하기 위하여 Zr-Cu-Si계 합금으로 이루어진 물리증착 타겟으로서, Zr이 82원자% 내지 90원자%; Cu가 4원자% 내지 14원자%; 및 Si이 4원자% 내지 8원자%;로 이루어진, 물리증착 타겟을 제공한다.