Equipment and Method for Doped Coating Using Filtered Cathodic Vacuum Arc

A disclosed apparatus for coating a doped thin film by using a filtered cathode vacuum arc source includes: a coating chamber provided as a deposition space; a filtered cathode vacuum arc source unit provided on one side of the coating chamber and supplying a carbon ion into the coating chamber; an...

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Bibliographische Detailangaben
Hauptverfasser:	IN, JUNG WHAN, HAN, MYUNG SOO, LEE, WEE SAM, CHOI, JU HYEON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A disclosed apparatus for coating a doped thin film by using a filtered cathode vacuum arc source includes: a coating chamber provided as a deposition space; a filtered cathode vacuum arc source unit provided on one side of the coating chamber and supplying a carbon ion into the coating chamber; an ion beam sputter unit provided on the other side of the coating chamber and supplying a doping atom into the coating chamber independently of the carbon ion; and a holder which is provided inside the coating chamber, wherein a body to be coated on which the carbon ion and the doping atom are deposited is arranged. 개시되는 자장여과 아크 소스를 이용하여 도핑된 박막을 코팅하는 장치는, 증착 공간으로 제공되는 코팅 챔버; 상기 코팅 챔버의 일 측에 구비되며, 상기 코팅 챔버 내부로 카본 이온을 공급하는 자장 여과 아크 소스 유닛; 상기 코팅 챔버의 타 측에 구비되며, 상기 코팅 챔버 내부로 상기 카본 이온과 독립적으로 도핑 원자를 공급하는 이온빔 스퍼터 유닛; 및 상기 코팅 챔버의 내부에 구비되며, 상기 카본 이온 및 상기 도핑 원자가 증착되는 피코팅체가 배치되는 홀더;를 포함한다.