Improved Heat Treatment Chamber and Heat Treatment Apparatus and System of Substrate Having the Same
The present invention discloses an improved substrate heat treatment chamber, and a substrate heat treatment apparatus and a system having the same. According to the present invention, the substrate heat treatment chamber includes: a thermal uniform plate provided to support a substrate and having a...
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| Format: | Patent |
| Sprache: | eng ; kor |
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| Zusammenfassung: | The present invention discloses an improved substrate heat treatment chamber, and a substrate heat treatment apparatus and a system having the same. According to the present invention, the substrate heat treatment chamber includes: a thermal uniform plate provided to support a substrate and having a plurality of support pins at an upper portion thereof; a main heat source provided on the upper portion of the substrate and supplying thermal energy to the upper portion of the substrate; and side heat sources provided on both side portions of the substrate.
본 발명은 개선된 기판 열처리 챔버, 및 이를 구비한 기판 열처리 장치 및 시스템을 개시한다. 본 발명에 따른 기판 열처리 챔버는 기판을 지지하도록 제공되며, 상부에 복수의 지지핀을 구비한 열균일판; 상기 기판의 상부에 제공되며, 상기 기판 상부에 열 에너지를 공급하는 메인 열원; 및 상기 기판의 양 측면부에 제공되는 측면 열원을 포함한다. |
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