FLUORO MONOMER AND OLIGOMER COMPOUNDS PHOTOPOLYMERIZED COMPOSITION AND HYDROPHOBIC FILM USING THE SAME

The present invention relates to novel fluorine-based monomer and oligomer compounds capable of remarkably increasing yield, a photopolymerized composition including the same, a preparing method thereof, and a hydrophobic film using the photopolymerized composition. The fluorine-based monomer compou...

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Bibliographische Detailangaben
Hauptverfasser:	LEE, YE JUNG, KIM, MYUNG HWA, KWON, YONG JU, KIM, WON SUK, JANG, HYE SU, YOON, YE SEUL
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to novel fluorine-based monomer and oligomer compounds capable of remarkably increasing yield, a photopolymerized composition including the same, a preparing method thereof, and a hydrophobic film using the photopolymerized composition. The fluorine-based monomer compound is represented by chemical formula 1 in which n is an integer of 1 to 5. 신규한 불소계 모노머 화합물, 불소계 올리고머 화합물, 이들을 포함하는 광중합형 조성물, 및 이들의 제조 방법과, 상기 광중합형 조성물을 이용한 소수성 필름에 관한 것이다.