INSPECTION DEVICE FOR MASKS FOR SEMICONDUCTOR LITHOGRAPHY AND METHOD

The present invention relates to an inspection device (4) for masks (8) for semiconductor lithography, which comprises: an imaging device (9) for imaging a mask (8); and an image recording device (10). The inspection device (4) has one or more correction bodies (21, 21′, 21″) which are arranged in t...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZEUNER THOMAS, SEITZ HOLGER, FELDMANN HEIKO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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