INSPECTION DEVICE FOR MASKS FOR SEMICONDUCTOR LITHOGRAPHY AND METHOD

The present invention relates to an inspection device (4) for masks (8) for semiconductor lithography, which comprises: an imaging device (9) for imaging a mask (8); and an image recording device (10). The inspection device (4) has one or more correction bodies (21, 21′, 21″) which are arranged in t...

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Bibliographische Detailangaben
Hauptverfasser:	ZEUNER THOMAS, SEITZ HOLGER, FELDMANN HEIKO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to an inspection device (4) for masks (8) for semiconductor lithography, which comprises: an imaging device (9) for imaging a mask (8); and an image recording device (10). The inspection device (4) has one or more correction bodies (21, 21′, 21″) which are arranged in the light path between the mask (8) and the image recording device (10) in order to exhibit a dispersive behavior for at least one subrange of an illumination radiation (6) used for the imaging. In addition, the present invention relates to a method for taking account of longitudinal chromatic aberrations in the inspection device (4) for the mask (8), which comprises the steps of: recording a specific number of images having different defocused positions (F1, F2, F3, F4, F5); and selecting a subset of the images and simulating a longitudinal chromatic aberration of a projection exposure apparatus. 반도체 리소그래피를 위한 마스크(8)의 검사 장치(4)로서, 마스크(8)를 이미징하는 이미징 장치(9); 이미지 기록 장치(10)를 포함하고, 이미징에 사용되는 상기 조명 방사선(6)의 적어도 하나의 서브 범위에 대한 분산 거동을 나타내는 하나 이상의 교정 바디(21, 21', 21")가 상기 마스크(8)와 상기 이미지 기록 장치(10) 사이의 광 경로에 배열되는, 검사 장치. 마스크(8)를 위한 검사 장치(4)에서의 길이방향 색수차(longitudinal chromatic aberration)를 고려하기 위한 방법으로서, 상이한 탈포커스 위치(F1, F2, F3, F4, F5)를 갖는 특정 수의 이미지들을 기록하는 단계, 상기 이미지들의 서브 세트를 선택하고 투영 노광 장치의 길이방향 색수차를 시뮬레이션하는 단계를 포함하는, 방법.