APPARATUS FOR PROCESSING SUBSTRATE

Disclosed is a substrate processing apparatus. The substrate processing apparatus for vaporizing or drying a substance on a substrate according to the present invention, comprises: a main body (100) including a chamber (101) for providing a substrate processing space; and a heating part (200) heatin...

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Bibliographische Detailangaben
Hauptverfasser:	KIM HYOUNG SOO, HUR KWAN SUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	Disclosed is a substrate processing apparatus. The substrate processing apparatus for vaporizing or drying a substance on a substrate according to the present invention, comprises: a main body (100) including a chamber (101) for providing a substrate processing space; and a heating part (200) heating the inside of the chamber (101), wherein a lower part (BC) of the main body (100) has a shape of which the size of a flat sectional area decreases from an upper end of the lower part (BC) to a lower end of the lower part (BC). 기판처리 장치가 개시된다. 본 발명에 따른 기판처리 장치는, 기판 상의 물질을 기화시키거나 건조시키는 기판처리 장치로서, 기판처리 공간을 제공하는 챔버(101)를 포함하는 본체(100) 및 챔버(101) 내부를 가열하는 발열부(200)를 포함하며, 본체(100)의 하부(BC)는 하부(BC) 상단에서 하부(BC) 하단으로 갈수록 평단면적의 크기가 작아지는 형상을 가지는 것을 특징으로 한다.