Dry film resist abrasive sheet abrasive sheet manufacturing apparatus and method
The present invention relates to a dry film resist, an abrasive sheet, an abrasive sheet manufacturing apparatus and a method thereof. According to an embodiment of the present invention, provided is the dry film resist having an abrasive particle that has a particle size of 0.1-100 um. Moreover, ac...
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| creator | MOON, DEOG JU CHO, SI HYEONG |
| description | The present invention relates to a dry film resist, an abrasive sheet, an abrasive sheet manufacturing apparatus and a method thereof. According to an embodiment of the present invention, provided is the dry film resist having an abrasive particle that has a particle size of 0.1-100 um. Moreover, according to the present invention, as the abrasive sheet is manufactured with a photolithography method, a mask can be manufactured and changed in a short time at very low costs compared to conventionally manufacturing and changing a mold.
본 발명은 드라이 필름 레지스트, 연마시트, 연마시트 제조장치 및 그 방법에 관한 것이다. 본 발명의 일 실시예에 따르면, 0.1 내지 100um의 입도를 갖는 연마입자를 포함하는 것을 특징으로 하는 드라이 필름 레지스트가 제공될 수 있다. 또한 본 발명은 포토리소그래피 방식으로 연마시트를 제조하기 때문에, 종래에 몰드(금형)를 제작 및 변경하는 것과 비교하여 매우 저렴한 비용으로 짧은 시간에 마스크를 제작 및 변경할 수 있다. |
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본 발명은 드라이 필름 레지스트, 연마시트, 연마시트 제조장치 및 그 방법에 관한 것이다. 본 발명의 일 실시예에 따르면, 0.1 내지 100um의 입도를 갖는 연마입자를 포함하는 것을 특징으로 하는 드라이 필름 레지스트가 제공될 수 있다. 또한 본 발명은 포토리소그래피 방식으로 연마시트를 제조하기 때문에, 종래에 몰드(금형)를 제작 및 변경하는 것과 비교하여 매우 저렴한 비용으로 짧은 시간에 마스크를 제작 및 변경할 수 있다.</description><language>eng ; kor</language><subject>ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; DYES ; ELECTROGRAPHY ; GRINDING ; HOLOGRAPHY ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; MATERIALS THEREFOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORIGINALS THEREFOR ; PAINTS ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; POLISHES ; POLISHING ; TOOLS FOR GRINDING, BUFFING, OR SHARPENING ; TRANSPORTING</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20181224&DB=EPODOC&CC=KR&NR=20180136124A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20181224&DB=EPODOC&CC=KR&NR=20180136124A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MOON, DEOG JU</creatorcontrib><creatorcontrib>CHO, SI HYEONG</creatorcontrib><title>Dry film resist abrasive sheet abrasive sheet manufacturing apparatus and method</title><description>The present invention relates to a dry film resist, an abrasive sheet, an abrasive sheet manufacturing apparatus and a method thereof. According to an embodiment of the present invention, provided is the dry film resist having an abrasive particle that has a particle size of 0.1-100 um. Moreover, according to the present invention, as the abrasive sheet is manufactured with a photolithography method, a mask can be manufactured and changed in a short time at very low costs compared to conventionally manufacturing and changing a mold.
본 발명은 드라이 필름 레지스트, 연마시트, 연마시트 제조장치 및 그 방법에 관한 것이다. 본 발명의 일 실시예에 따르면, 0.1 내지 100um의 입도를 갖는 연마입자를 포함하는 것을 특징으로 하는 드라이 필름 레지스트가 제공될 수 있다. 또한 본 발명은 포토리소그래피 방식으로 연마시트를 제조하기 때문에, 종래에 몰드(금형)를 제작 및 변경하는 것과 비교하여 매우 저렴한 비용으로 짧은 시간에 마스크를 제작 및 변경할 수 있다.</description><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>DYES</subject><subject>ELECTROGRAPHY</subject><subject>GRINDING</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>POLISHING</subject><subject>TOOLS FOR GRINDING, BUFFING, OR SHARPENING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAhwKapUSMvMyVUoSi3OLC5RSEwqSizOLEtVKM5ITcXg5ibmlaYlJpeUFmXmpSskFhQkFiWWlBYrJOalKOSmlmTkp_AwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUknjvICMDQwsDQ2MzQyMTR2PiVAEAmlc4gQ</recordid><startdate>20181224</startdate><enddate>20181224</enddate><creator>MOON, DEOG JU</creator><creator>CHO, SI HYEONG</creator><scope>EVB</scope></search><sort><creationdate>20181224</creationdate><title>Dry film resist abrasive sheet abrasive sheet manufacturing apparatus and method</title><author>MOON, DEOG JU ; CHO, SI HYEONG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20180136124A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2018</creationdate><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>DYES</topic><topic>ELECTROGRAPHY</topic><topic>GRINDING</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>POLISHING</topic><topic>TOOLS FOR GRINDING, BUFFING, OR SHARPENING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>MOON, DEOG JU</creatorcontrib><creatorcontrib>CHO, SI HYEONG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MOON, DEOG JU</au><au>CHO, SI HYEONG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Dry film resist abrasive sheet abrasive sheet manufacturing apparatus and method</title><date>2018-12-24</date><risdate>2018</risdate><abstract>The present invention relates to a dry film resist, an abrasive sheet, an abrasive sheet manufacturing apparatus and a method thereof. According to an embodiment of the present invention, provided is the dry film resist having an abrasive particle that has a particle size of 0.1-100 um. Moreover, according to the present invention, as the abrasive sheet is manufactured with a photolithography method, a mask can be manufactured and changed in a short time at very low costs compared to conventionally manufacturing and changing a mold.
본 발명은 드라이 필름 레지스트, 연마시트, 연마시트 제조장치 및 그 방법에 관한 것이다. 본 발명의 일 실시예에 따르면, 0.1 내지 100um의 입도를 갖는 연마입자를 포함하는 것을 특징으로 하는 드라이 필름 레지스트가 제공될 수 있다. 또한 본 발명은 포토리소그래피 방식으로 연마시트를 제조하기 때문에, 종래에 몰드(금형)를 제작 및 변경하는 것과 비교하여 매우 저렴한 비용으로 짧은 시간에 마스크를 제작 및 변경할 수 있다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY DYES ELECTROGRAPHY GRINDING HOLOGRAPHY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORIGINALS THEREFOR PAINTS PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES POLISHING TOOLS FOR GRINDING, BUFFING, OR SHARPENING TRANSPORTING |
| title | Dry film resist abrasive sheet abrasive sheet manufacturing apparatus and method |
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