Substrate treating apparatus and substrate treating method
The present invention relates to a substrate treating apparatus and a substrate treating method. The substrate treating apparatus according to one embodiment of the present invention comprises: a support member supporting a substrate and provided to be rotatable; a treatment liquid feeding unit for...
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| creator | LEE YOUNGIL KIM KWANG RYUL LEE KWANG SEOP SONG GIL HUN PARK GUI SU KIM BONG JOO CHOI JUNGBONG BANG BYUNGSUN |
| description | The present invention relates to a substrate treating apparatus and a substrate treating method. The substrate treating apparatus according to one embodiment of the present invention comprises: a support member supporting a substrate and provided to be rotatable; a treatment liquid feeding unit for feeding a chemical to the substrate; and a laser irradiating unit for irradiating a laser on the top surface of the substrate fed with the chemical.
본 발명은 기판 처리 장치 및 기판 처리 방법에 관한 것이다. 본 발명의 일 실시 예에 따른 기판 처리 장치는 기판을 지지하며 회전 가능하게 제공되는 지지 부재; 상기 기판으로 케미칼을 공급하는 처리액 공급 유닛; 및 상기 케미칼이 공급된 상기 기판의 상면으로 레이저를 조사하는 레이저 조사 유닛을 포함한다. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20180127150A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20180127150A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20180127150A3</originalsourceid><addsrcrecordid>eNrjZLAKLk0qLilKLElVKClKTSzJzEtXSCwoSASKlBYrJOalKBRjKshNLcnIT-FhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHeQUYGhhYGhkbmhqYGjsbEqQIAiK4wjg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Substrate treating apparatus and substrate treating method</title><source>esp@cenet</source><creator>LEE YOUNGIL ; KIM KWANG RYUL ; LEE KWANG SEOP ; SONG GIL HUN ; PARK GUI SU ; KIM BONG JOO ; CHOI JUNGBONG ; BANG BYUNGSUN</creator><creatorcontrib>LEE YOUNGIL ; KIM KWANG RYUL ; LEE KWANG SEOP ; SONG GIL HUN ; PARK GUI SU ; KIM BONG JOO ; CHOI JUNGBONG ; BANG BYUNGSUN</creatorcontrib><description>The present invention relates to a substrate treating apparatus and a substrate treating method. The substrate treating apparatus according to one embodiment of the present invention comprises: a support member supporting a substrate and provided to be rotatable; a treatment liquid feeding unit for feeding a chemical to the substrate; and a laser irradiating unit for irradiating a laser on the top surface of the substrate fed with the chemical.
본 발명은 기판 처리 장치 및 기판 처리 방법에 관한 것이다. 본 발명의 일 실시 예에 따른 기판 처리 장치는 기판을 지지하며 회전 가능하게 제공되는 지지 부재; 상기 기판으로 케미칼을 공급하는 처리액 공급 유닛; 및 상기 케미칼이 공급된 상기 기판의 상면으로 레이저를 조사하는 레이저 조사 유닛을 포함한다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20181128&DB=EPODOC&CC=KR&NR=20180127150A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20181128&DB=EPODOC&CC=KR&NR=20180127150A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LEE YOUNGIL</creatorcontrib><creatorcontrib>KIM KWANG RYUL</creatorcontrib><creatorcontrib>LEE KWANG SEOP</creatorcontrib><creatorcontrib>SONG GIL HUN</creatorcontrib><creatorcontrib>PARK GUI SU</creatorcontrib><creatorcontrib>KIM BONG JOO</creatorcontrib><creatorcontrib>CHOI JUNGBONG</creatorcontrib><creatorcontrib>BANG BYUNGSUN</creatorcontrib><title>Substrate treating apparatus and substrate treating method</title><description>The present invention relates to a substrate treating apparatus and a substrate treating method. The substrate treating apparatus according to one embodiment of the present invention comprises: a support member supporting a substrate and provided to be rotatable; a treatment liquid feeding unit for feeding a chemical to the substrate; and a laser irradiating unit for irradiating a laser on the top surface of the substrate fed with the chemical.
본 발명은 기판 처리 장치 및 기판 처리 방법에 관한 것이다. 본 발명의 일 실시 예에 따른 기판 처리 장치는 기판을 지지하며 회전 가능하게 제공되는 지지 부재; 상기 기판으로 케미칼을 공급하는 처리액 공급 유닛; 및 상기 케미칼이 공급된 상기 기판의 상면으로 레이저를 조사하는 레이저 조사 유닛을 포함한다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAKLk0qLilKLElVKClKTSzJzEtXSCwoSASKlBYrJOalKBRjKshNLcnIT-FhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHeQUYGhhYGhkbmhqYGjsbEqQIAiK4wjg</recordid><startdate>20181128</startdate><enddate>20181128</enddate><creator>LEE YOUNGIL</creator><creator>KIM KWANG RYUL</creator><creator>LEE KWANG SEOP</creator><creator>SONG GIL HUN</creator><creator>PARK GUI SU</creator><creator>KIM BONG JOO</creator><creator>CHOI JUNGBONG</creator><creator>BANG BYUNGSUN</creator><scope>EVB</scope></search><sort><creationdate>20181128</creationdate><title>Substrate treating apparatus and substrate treating method</title><author>LEE YOUNGIL ; KIM KWANG RYUL ; LEE KWANG SEOP ; SONG GIL HUN ; PARK GUI SU ; KIM BONG JOO ; CHOI JUNGBONG ; BANG BYUNGSUN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20180127150A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2018</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>LEE YOUNGIL</creatorcontrib><creatorcontrib>KIM KWANG RYUL</creatorcontrib><creatorcontrib>LEE KWANG SEOP</creatorcontrib><creatorcontrib>SONG GIL HUN</creatorcontrib><creatorcontrib>PARK GUI SU</creatorcontrib><creatorcontrib>KIM BONG JOO</creatorcontrib><creatorcontrib>CHOI JUNGBONG</creatorcontrib><creatorcontrib>BANG BYUNGSUN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LEE YOUNGIL</au><au>KIM KWANG RYUL</au><au>LEE KWANG SEOP</au><au>SONG GIL HUN</au><au>PARK GUI SU</au><au>KIM BONG JOO</au><au>CHOI JUNGBONG</au><au>BANG BYUNGSUN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Substrate treating apparatus and substrate treating method</title><date>2018-11-28</date><risdate>2018</risdate><abstract>The present invention relates to a substrate treating apparatus and a substrate treating method. The substrate treating apparatus according to one embodiment of the present invention comprises: a support member supporting a substrate and provided to be rotatable; a treatment liquid feeding unit for feeding a chemical to the substrate; and a laser irradiating unit for irradiating a laser on the top surface of the substrate fed with the chemical.
본 발명은 기판 처리 장치 및 기판 처리 방법에 관한 것이다. 본 발명의 일 실시 예에 따른 기판 처리 장치는 기판을 지지하며 회전 가능하게 제공되는 지지 부재; 상기 기판으로 케미칼을 공급하는 처리액 공급 유닛; 및 상기 케미칼이 공급된 상기 기판의 상면으로 레이저를 조사하는 레이저 조사 유닛을 포함한다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | Substrate treating apparatus and substrate treating method |
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