Method for forming fine pattern using conductive particles

The present invention relates to a method for fine patterning of conductive particles, which comprises the following steps: (S10) forming a mask pattern using mask particles on a base substrate; and forming a metal pattern on the base substrate on which the mask pattern is formed by selectively atta...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KIM, JAE HO, PARK, JEUNG KYUN, KIM, HYO SOP, JEONG, SEONG HYEON, CHOI, MI YEON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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