ELECTROLYTE COMPOSITION AND CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE USING THE SAME

The present invention relates to an electrolyte composition used for producing electrolytic ionized water used for cleaning semiconductor substrates and a method for cleaning semiconductor substrates using the same. The electrolyte composition comprises: a solvent; a fluorine compound; and at least...

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Bibliographische Detailangaben
Hauptverfasser:	YOO, YOUN SUG, LEE, JIN UK, LIM, JUNG HUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	The present invention relates to an electrolyte composition used for producing electrolytic ionized water used for cleaning semiconductor substrates and a method for cleaning semiconductor substrates using the same. The electrolyte composition comprises: a solvent; a fluorine compound; and at least one corrosion inhibiting compound selected from the group consisting of an amine compound, an aniline compound, an imidazoline compound and a triazoline compound. 본 발명은 반도체 기판의 세정에 사용되는 전해 이온수를 생성하는데 사용되는 전해질 조성물 및 이를 이용하여 반도체 기판을 세정하는 방법에 관한 것이다.