AMBIENT CONTROLLED TRANSFER MODULE AND PROCESS SYSTEM

According to the present invention, provided are a method and an apparatus for processing a substrate. In one implementation, the apparatus includes a load lock chamber coupled to a transfer chamber. The transfer chamber is coupled to a thermal process chamber and a substrate is transferred between...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	ASSAF SHAY, NEWMAN JACOB, HICKERSON STEPHEN, CARLSON CHARLES, CONSTANT ANDREW, WEAVER WILLIAM TYLER
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	According to the present invention, provided are a method and an apparatus for processing a substrate. In one implementation, the apparatus includes a load lock chamber coupled to a transfer chamber. The transfer chamber is coupled to a thermal process chamber and a substrate is transferred between each of the load lock chamber, the transfer chamber, and the thermal process chamber. In other implementations, a process platform having a load lock chamber, a transfer chamber, and a thermal process chamber is disclosed. According to the present invention, a method of measuring oxygen concentration in a load lock chamber via evacuation of a transfer chamber is also described. 본 명세서에서는 기판을 처리하기 위한 방법 및 장치가 제공된다. 일 구현에서, 장치는 이송 챔버에 결합된 로드 락 챔버를 포함한다. 이송 챔버는 열 프로세스 챔버에 결합되고, 기판은 로드 락 챔버, 이송 챔버, 및 열 프로세스 챔버 각각의 사이에서 이송된다. 다른 구현들에서, 로드 락 챔버, 이송 챔버, 및 열 프로세스 챔버를 갖는 프로세스 플랫폼이 개시된다. 이송 챔버를 비우는 것을 통해 로드 락 챔버 내의 산소 농도를 측정하는 방법이 또한 본 명세서에 설명된다.