IZO INDIUM ZINC OXIDE IZO BASED SPUTTERING TARGET AND METHOD FOR PRODUCING SAME

The present invention provides a method for manufacturing indium oxide-zinc oxide based oxide (IZO) sintered body target in which warping of a sintered body is small and in-plane deviation of a bulk resistivity due to grinding is suppressed for reducing warpage. The sputtering target is made of In,...

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Bibliographische Detailangaben
1. Verfasser:	KAKENO TAKASHI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ARTIFICIAL STONE CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY REFRACTORIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE
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Beschreibung
Zusammenfassung:	The present invention provides a method for manufacturing indium oxide-zinc oxide based oxide (IZO) sintered body target in which warping of a sintered body is small and in-plane deviation of a bulk resistivity due to grinding is suppressed for reducing warpage. The sputtering target is made of In, Zn, and O, and is characterized by having the atomic ratio of Zn and In which satisfies 0.05