Unit for supplying chemical Apparatus for treating substrate and Method for removal bubble

The present invention relates to an apparatus for treating a substrate with a liquid and a method thereof. The substrate treatment apparatus includes a substrate support unit for supporting a substrate and a liquid supply unit for supplying a treatment liquid, which is prepared by mixing first and s...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BANG, BYUNG SUN, JANG, YOUNG JIN, KIM, JONG HAN, YU, JIN TACK, CHOI, YOUNG JUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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