MASK TREATING APPARATUS AND MASK TREATING METHOD

A mask processing apparatus according to an embodiment of the present invention includes: a process chamber in which a blank mask package including a blank mask is introduced and unpacking the blank mask package to process the blank mask; an unpacking unit disposed in the process chamber and unpacki...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	JEONG, YUN SONG, UHM, HYUN SEOK, LEE, SUN PYO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A mask processing apparatus according to an embodiment of the present invention includes: a process chamber in which a blank mask package including a blank mask is introduced and unpacking the blank mask package to process the blank mask; an unpacking unit disposed in the process chamber and unpacking the blank mask package; and a laser marking unit disposed in the process chamber and emitting a laser beam onto the blank mask to form a reference mark. 본 발명의 일 실시예에 따른 마스크 처리 장치는, 블랭크 마스크를 포함하는 블랭크 마스크 패키지가 유입되고, 상기 블랭크 마스크 패키지를 언패킹하여 상기 블랭크 마스크에 대해 공정을 진행하는 공정 챔버, 상기 공정 챔버 내 배치되고, 상기 블랭크 마스크 패키지를 언패킹하는 언패킹 유닛 및 상기 공정 챔버 내 배치되고, 상기 블랭크 마스크에 대해 레이저를 조사하여 기준 마크를 형성하는 레이저 마킹 유닛을 포함한다.