PREPARATION METHOD FOR HIGHLY PURE TENOFOVIR DISOPROXIL

The present invention discloses a method for manufacturing high purity tenofovir disoproxil. The method comprises the steps of: (i) reacting crude tenofovir disoproxil with muconic acid to manufacture tenofovir disoproxil muconate; (TDM); and (ii) neutralizing the manufactured tenofovir disoproxil m...

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Bibliographische Detailangaben
Hauptverfasser: HAN, GA RAM, HAN HAIZHU, KIM, HYEON JEONG, LEE, IN KYU, KIM, A REUM, CHUNG, IN HWA, MO, KIL WOONG
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:The present invention discloses a method for manufacturing high purity tenofovir disoproxil. The method comprises the steps of: (i) reacting crude tenofovir disoproxil with muconic acid to manufacture tenofovir disoproxil muconate; (TDM); and (ii) neutralizing the manufactured tenofovir disoproxil muconate to obtain tenofovir disoproxil. By using the method, 99.7% or more, or 99.9% or more of high purity tenofovir disoproxil can be obtained. 본 명세서에는, 고순도 테노포비어 디소프록실을 제조하는 방법으로서, 상기 방법은, (i) 조 테노포비어 디소프록실(조 TD, crude TENOFOVIR DISOPROXIL)과 뮤콘산(Muconic acid)을 반응시켜 테노포비어 디소프록실 뮤콘산염(TDM)을 제조하는 단계; 및 (ii) 상기 제조된 테노포비어 디소프록실 뮤콘산염을 중화시켜 테노포비어 디소프록실을 수득하는 단계를 포함하는 방법에 개시된다. 상기 방법을 이용하면 99.7% 이상, 또는 99.9% 이상의 고순도 테노포비어 디소프록실을 얻을 수 있다.