MANUFACTURING METHOD AND SYSTEM OF NANOSTRUCTURE BY HOLLOW CATHODE DISCHARGE

MANUFACTURING METHOD AND SYSTEM OF NANOSTRUCTURE BY HOLLOW CATHODE DISCHARGE

It is an object of the present invention to provide a method and a device capable of uniformly forming a nanostructure on a large-area substrate. According to one aspect of the present invention, hollow cathode discharge is used, one surface of a hollow cathode is formed with a metal mesh, and two h...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: YEO, KI HO, SHIN, EUI CHUL, MOON, JOON YONG, JUN, YOUNG HA, CHEON, JAE MIN
Format: Patent
Sprache:eng ; kor
Schlagworte:
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MANUFACTURE OR TREATMENT THEREOF
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS
NANOTECHNOLOGY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
THEIR RELEVANT APPARATUS
TRANSPORTING
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Beschreibung
Zusammenfassung:It is an object of the present invention to provide a method and a device capable of uniformly forming a nanostructure on a large-area substrate. According to one aspect of the present invention, hollow cathode discharge is used, one surface of a hollow cathode is formed with a metal mesh, and two hollow cathodes with the mesh surfaces are disposed to be spaced, wherein the mesh surfaces are disposed inward to face each other, a substrate is disposed therebetween, and plasma is discharged in the hollow cathodes to form the nanostructure on both surfaces of the substrate. 본 발명의 목적은 대면적 기재에 나노구조체를 균일하게 형성할 수 있는 방법과 장치를 제공하고자 하는 것이다. 상기 목적에 따라 본 발명은, 중공음극방전을 이용하되, 중공음극의 한 면을 금속 망으로 형성하고, 이와 같이 망으로 된 면을 보유한 중공음극을 두 개를 이격하여 배치하되, 망으로 된 면이 서로 안쪽으로 배치되어 마주하게 하고, 그 사이에 기재를 배치하여, 중공음극에서 플라즈마를 방전시켜 기재의 양면에 대해 나노구조체를 형성하게 하였다.