HOLLOW METAL OXIDE POWDER AND PREPARING METHOD OF THE HOLLOW METAL OXIDE POWDER

The present invention relates to hollow metal oxide powder and a manufacturing method thereof. The manufacturing method of metal oxide powder of one embodiment of the present invention comprises: a step of depositing a metal oxide shell on a core to produce core-shell particles; and a step of removi...

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Bibliographische Detailangaben
Hauptverfasser:	HAN, MAN JUN, KIM, HYUNG SOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM,CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THERARE-EARTH METALS COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention relates to hollow metal oxide powder and a manufacturing method thereof. The manufacturing method of metal oxide powder of one embodiment of the present invention comprises: a step of depositing a metal oxide shell on a core to produce core-shell particles; and a step of removing the core of the core-shell particles. The deposition of the metal oxide shell is performed using chemical vapor deposition (CVD), physical vapor deposition (PVD), or both. 본 발명은 중공형 금속산화물 분말 및 그의 제조방법에 관한 것으로서, 본 발명의 일 실시예에 따른 중공형 금속산화물 분말의 제조방법은 코어에 금속산화물 쉘을 증착하여 코어-쉘 입자를 제조하는 단계; 및 상기 코어-쉘 입자의 코어를 제거하는 단계를 포함하고, 상기 금속산화물 쉘의 증착은, 화학적 기상 증착(chemical vapor deposition; CVD), 물리적 기상 증착(physical vapor deposition; PVD) 또는 이 둘 모두를 이용하여 수행하는 것이다.