SYSTEM FOR CONTROLLING VACUUM IN PROCESS-CHAMBER AND METHOD USING THE SAME

A system and a method for controlling a vacuum state of a process chamber are disclosed. According to an embodiment of the present invention, the system for controlling a vacuum state of a process chamber comprises: a process chamber; a vacuum pump to make the process chamber in a vacuum state; a va...

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Bibliographische Detailangaben
1. Verfasser:	JUNG, HYO SANG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A system and a method for controlling a vacuum state of a process chamber are disclosed. According to an embodiment of the present invention, the system for controlling a vacuum state of a process chamber comprises: a process chamber; a vacuum pump to make the process chamber in a vacuum state; a vacuum line for connecting the process chamber to the vacuum pump; one of more vacuum systems installed in a preset position of the vacuum line and the process chamber; and a vacuum controller for controlling the operation speed of the vacuum pump by using a measurement value of the vacuum system. 공정 챔버 진공 제어 시스템 및 방법이 개시된다. 본 발명의 일실시예에 따른 공정 챔버 진공 제어 시스템은 공정 챔버; 상기 공정 챔버를 진공 상태로 만들기 위한 진공 펌프; 상기 공정 챔버와 상기 진공 펌프를 연결하는 진공 라인; 상기 공정 챔버 및 상기 진공 라인의 기설정된 위치에 설치되는 하나 이상의 진공계 및 상기 진공계의 측정값을 이용하여 상기 진공 펌프의 동작 속도를 제어하는 진공 컨트롤러를 포함한다.