ELECTROSTATIC CHUCK AND ELECTROSTATIC ADSORPTION APPARATUS
An electrostatic chuck comprises: a main body portion including a body portion including a penetration hole and a transparent resin portion filled in the penetration hole; a transparent cushion layer located in the main body portion and covering the transparent resin portion; an electrode layer loca...
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| creator | BAE, MIN HO KIM, BYUNG MOO KIM, YUN SOO YOUN, TAE HO |
| description | An electrostatic chuck comprises: a main body portion including a body portion including a penetration hole and a transparent resin portion filled in the penetration hole; a transparent cushion layer located in the main body portion and covering the transparent resin portion; an electrode layer located on the transparent cushion layer; and a dielectric layer located on the electrode layer, thereby capable of easily aligning an adsorbate.
정전 척은 관통홀을 포함하는 바디부 그리고 상기 관통홀에 채워진 투명 수지부를 포함하는 본체부, 상기 본체부 상에 위치하며 상기 투명 수지부를 덮는 투명 쿠션층, 상기 투명 쿠션층 상에 위치하는 전극층, 그리고 상기 전극층 상에 위치하는 유전층을 포함한다. |
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정전 척은 관통홀을 포함하는 바디부 그리고 상기 관통홀에 채워진 투명 수지부를 포함하는 본체부, 상기 본체부 상에 위치하며 상기 투명 수지부를 덮는 투명 쿠션층, 상기 투명 쿠션층 상에 위치하는 전극층, 그리고 상기 전극층 상에 위치하는 유전층을 포함한다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180514&DB=EPODOC&CC=KR&NR=20180049855A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180514&DB=EPODOC&CC=KR&NR=20180049855A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BAE, MIN HO</creatorcontrib><creatorcontrib>KIM, BYUNG MOO</creatorcontrib><creatorcontrib>KIM, YUN SOO</creatorcontrib><creatorcontrib>YOUN, TAE HO</creatorcontrib><title>ELECTROSTATIC CHUCK AND ELECTROSTATIC ADSORPTION APPARATUS</title><description>An electrostatic chuck comprises: a main body portion including a body portion including a penetration hole and a transparent resin portion filled in the penetration hole; a transparent cushion layer located in the main body portion and covering the transparent resin portion; an electrode layer located on the transparent cushion layer; and a dielectric layer located on the electrode layer, thereby capable of easily aligning an adsorbate.
정전 척은 관통홀을 포함하는 바디부 그리고 상기 관통홀에 채워진 투명 수지부를 포함하는 본체부, 상기 본체부 상에 위치하며 상기 투명 수지부를 덮는 투명 쿠션층, 상기 투명 쿠션층 상에 위치하는 전극층, 그리고 상기 전극층 상에 위치하는 유전층을 포함한다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBy9XF1DgnyDw5xDPF0VnD2CHX2VnD0c1FAFXd0CfYPCgjx9PdTcAwIcAxyDAkN5mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgaGFgYGJpYWpqaOxsSpAgCB1SpS</recordid><startdate>20180514</startdate><enddate>20180514</enddate><creator>BAE, MIN HO</creator><creator>KIM, BYUNG MOO</creator><creator>KIM, YUN SOO</creator><creator>YOUN, TAE HO</creator><scope>EVB</scope></search><sort><creationdate>20180514</creationdate><title>ELECTROSTATIC CHUCK AND ELECTROSTATIC ADSORPTION APPARATUS</title><author>BAE, MIN HO ; KIM, BYUNG MOO ; KIM, YUN SOO ; YOUN, TAE HO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20180049855A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2018</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>BAE, MIN HO</creatorcontrib><creatorcontrib>KIM, BYUNG MOO</creatorcontrib><creatorcontrib>KIM, YUN SOO</creatorcontrib><creatorcontrib>YOUN, TAE HO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BAE, MIN HO</au><au>KIM, BYUNG MOO</au><au>KIM, YUN SOO</au><au>YOUN, TAE HO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ELECTROSTATIC CHUCK AND ELECTROSTATIC ADSORPTION APPARATUS</title><date>2018-05-14</date><risdate>2018</risdate><abstract>An electrostatic chuck comprises: a main body portion including a body portion including a penetration hole and a transparent resin portion filled in the penetration hole; a transparent cushion layer located in the main body portion and covering the transparent resin portion; an electrode layer located on the transparent cushion layer; and a dielectric layer located on the electrode layer, thereby capable of easily aligning an adsorbate.
정전 척은 관통홀을 포함하는 바디부 그리고 상기 관통홀에 채워진 투명 수지부를 포함하는 본체부, 상기 본체부 상에 위치하며 상기 투명 수지부를 덮는 투명 쿠션층, 상기 투명 쿠션층 상에 위치하는 전극층, 그리고 상기 전극층 상에 위치하는 유전층을 포함한다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | ELECTROSTATIC CHUCK AND ELECTROSTATIC ADSORPTION APPARATUS |
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