SUBSTRATE SUPPORT UNIT SUBSTRATE TREATING APPARAUTS INCLUDING THE SAME AND METHOD FOR CONTROLLING THE SAME

An object of the present invention is to extend a replacement cycle by reducing the degree of abrasion of a ring member provided around a substrate supporter by easily controlling an electric field in the peripheral part of a substrate in a substrate processing apparatus performing a plasma process....

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	AN, JONG HWAN, RO, SOO RYUN, GU, JA MYUNG, NAM, SHIN WOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!