COMPOSITION FOR HARD MASK

The present invention relates to a composition for hardmasks. More specifically, the present invention relates to a composition for hardmasks, which contains a solvent and a copolymer having repeating units with specific structures, ensures excellent solubility and uniformity in coating, and is capa...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	CHOI, HAN YOUNG, YANG, DON SIK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to a composition for hardmasks. More specifically, the present invention relates to a composition for hardmasks, which contains a solvent and a copolymer having repeating units with specific structures, ensures excellent solubility and uniformity in coating, and is capable of forming resist primers (hardmasks) exhibiting superior crack-resistance after film deposition. 본 발명은 하드마스크용 조성물에 관한 것으로서, 보다 상세하게는 특정 구조의 반복단위들을 포함하는 공중합체, 및 용매를 포함함으로써, 용해성 및 코팅 균일성이 우수하고 성막 후 내크랙성이 우수한 레지스트 하층막(하드마스크)을 형성할 수 있는 하드마스크용 조성물에 관한 것이다.