THERMAL DESORPTION SYSTEM AND METHOD OF ANALYZING A SUBSTRATE USING THE SAME

A thermal desorption system comprises: a chamber providing a space to heat a substrate; a flow compartment arranged in the chamber, and providing a gas flow space divided in a space of the chamber; a substrate support unit to support the substrate within the flow compartment; a heating device to hea...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	MOON, HYE KYOUNG, SUK, KYUNG JU, LIM, KWANG SHIN, PARK, EUN HEE, KIM, SANG HWAN, PARK, JUNG DAE, SUH, MIN SOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS SEMICONDUCTOR DEVICES TESTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A thermal desorption system comprises: a chamber providing a space to heat a substrate; a flow compartment arranged in the chamber, and providing a gas flow space divided in a space of the chamber; a substrate support unit to support the substrate within the flow compartment; a heating device to heat the substrate within the flow compartment; and a gas pipe device to enable carrier gas to be introduced into and discharged from the flow compartment from the outside of the chamber. 열 탈착 시스템은 기판을 가열하기 위한 공간을 제공하는 챔버, 상기 챔버 내에 배치되며 상기 챔버 공간 내의 구분된 가스 유동 공간을 제공하는 유동 격실, 상기 유동 격실 내에서 상기 기판을 지지하기 위한 기판 지지부, 상기 유동 격실 내의 상기 기판을 가열하기 위한 가열 장치, 및 상기 챔버 외부로부터 상기 유동 격실 내로 캐리어 가스를 유입 및 유출시키기 위한 가스 배관 장치를 포함한다.