OXIDE SINTERED COMPACT
실질적으로 인듐, 주석, 마그네슘 및 산소로 이루어지고, 주석이 Sn/(In + Sn + Mg) 의 원자수 비로 5 ∼ 15 % 의 비율, 마그네슘이 Mg/(In + Sn + Mg) 의 원자수 비로 0.1 ∼ 2.0 % 의 비율로 함유되어 있고, 잔부가 인듐 및 산소로 이루어지는 소결체로서, 상기 소결체의 표면 조도 Ra 가 0.3 ∼ 0.5 ㎛ 일 때의 항절 강도가 140 ㎫ 이상인 것을 특징으로 하는 산화물 소결체. 성막시에 타깃 균열이나 파티클 발생을 저감시킬 수 있음과 함께, 비정질 안정성이나 내구성이 우수한 박막을 형성할...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng ; kor |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | KAKENO TAKASHI KAKUTA KOJI |
description | 실질적으로 인듐, 주석, 마그네슘 및 산소로 이루어지고, 주석이 Sn/(In + Sn + Mg) 의 원자수 비로 5 ∼ 15 % 의 비율, 마그네슘이 Mg/(In + Sn + Mg) 의 원자수 비로 0.1 ∼ 2.0 % 의 비율로 함유되어 있고, 잔부가 인듐 및 산소로 이루어지는 소결체로서, 상기 소결체의 표면 조도 Ra 가 0.3 ∼ 0.5 ㎛ 일 때의 항절 강도가 140 ㎫ 이상인 것을 특징으로 하는 산화물 소결체. 성막시에 타깃 균열이나 파티클 발생을 저감시킬 수 있음과 함께, 비정질 안정성이나 내구성이 우수한 박막을 형성할 수 있는 스퍼터링 타깃용 산화물 소결체를 제공하는 것을 과제로 한다.
An oxide sintered body substantially formed from indium, tin, magnesium and oxygen, wherein tin is contained at a ratio of 5 to 15% in terms of an atomic ratio of Sn/(In+Sn+Mg), magnesium is contained at a ratio of 0.1 to 2.0% in terms of an atomic ratio of Mg/(In+Sn+Mg), and remainder being indium and oxygen, and wherein a flexural strength of the oxide sintered body is 140 MPa or more when a surface roughness Ra of the oxide sintered body is 0.3 to 0.5 μm. Provided is an oxide sintered body for use as a sputtering target capable of reducing target cracking and particle generation during deposition, and capable of forming a thin film which exhibits superior amorphous stability and durability. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20180014037A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20180014037A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20180014037A3</originalsourceid><addsrcrecordid>eNrjZBDzj_B0cVUI9vQLcQ1ydVFw9vcNcHQO4WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgaGFgYGhiYGxuaOxsSpAgArZR_r</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>OXIDE SINTERED COMPACT</title><source>esp@cenet</source><creator>KAKENO TAKASHI ; KAKUTA KOJI</creator><creatorcontrib>KAKENO TAKASHI ; KAKUTA KOJI</creatorcontrib><description>실질적으로 인듐, 주석, 마그네슘 및 산소로 이루어지고, 주석이 Sn/(In + Sn + Mg) 의 원자수 비로 5 ∼ 15 % 의 비율, 마그네슘이 Mg/(In + Sn + Mg) 의 원자수 비로 0.1 ∼ 2.0 % 의 비율로 함유되어 있고, 잔부가 인듐 및 산소로 이루어지는 소결체로서, 상기 소결체의 표면 조도 Ra 가 0.3 ∼ 0.5 ㎛ 일 때의 항절 강도가 140 ㎫ 이상인 것을 특징으로 하는 산화물 소결체. 성막시에 타깃 균열이나 파티클 발생을 저감시킬 수 있음과 함께, 비정질 안정성이나 내구성이 우수한 박막을 형성할 수 있는 스퍼터링 타깃용 산화물 소결체를 제공하는 것을 과제로 한다.
An oxide sintered body substantially formed from indium, tin, magnesium and oxygen, wherein tin is contained at a ratio of 5 to 15% in terms of an atomic ratio of Sn/(In+Sn+Mg), magnesium is contained at a ratio of 0.1 to 2.0% in terms of an atomic ratio of Mg/(In+Sn+Mg), and remainder being indium and oxygen, and wherein a flexural strength of the oxide sintered body is 140 MPa or more when a surface roughness Ra of the oxide sintered body is 0.3 to 0.5 μm. Provided is an oxide sintered body for use as a sputtering target capable of reducing target cracking and particle generation during deposition, and capable of forming a thin film which exhibits superior amorphous stability and durability.</description><language>eng ; kor</language><subject>ARTIFICIAL STONE ; CEMENTS ; CERAMICS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS ; CONCRETE ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; LIME, MAGNESIA ; METALLURGY ; REFRACTORIES ; SLAG ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TREATMENT OF NATURAL STONE</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180207&DB=EPODOC&CC=KR&NR=20180014037A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180207&DB=EPODOC&CC=KR&NR=20180014037A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KAKENO TAKASHI</creatorcontrib><creatorcontrib>KAKUTA KOJI</creatorcontrib><title>OXIDE SINTERED COMPACT</title><description>실질적으로 인듐, 주석, 마그네슘 및 산소로 이루어지고, 주석이 Sn/(In + Sn + Mg) 의 원자수 비로 5 ∼ 15 % 의 비율, 마그네슘이 Mg/(In + Sn + Mg) 의 원자수 비로 0.1 ∼ 2.0 % 의 비율로 함유되어 있고, 잔부가 인듐 및 산소로 이루어지는 소결체로서, 상기 소결체의 표면 조도 Ra 가 0.3 ∼ 0.5 ㎛ 일 때의 항절 강도가 140 ㎫ 이상인 것을 특징으로 하는 산화물 소결체. 성막시에 타깃 균열이나 파티클 발생을 저감시킬 수 있음과 함께, 비정질 안정성이나 내구성이 우수한 박막을 형성할 수 있는 스퍼터링 타깃용 산화물 소결체를 제공하는 것을 과제로 한다.
An oxide sintered body substantially formed from indium, tin, magnesium and oxygen, wherein tin is contained at a ratio of 5 to 15% in terms of an atomic ratio of Sn/(In+Sn+Mg), magnesium is contained at a ratio of 0.1 to 2.0% in terms of an atomic ratio of Mg/(In+Sn+Mg), and remainder being indium and oxygen, and wherein a flexural strength of the oxide sintered body is 140 MPa or more when a surface roughness Ra of the oxide sintered body is 0.3 to 0.5 μm. Provided is an oxide sintered body for use as a sputtering target capable of reducing target cracking and particle generation during deposition, and capable of forming a thin film which exhibits superior amorphous stability and durability.</description><subject>ARTIFICIAL STONE</subject><subject>CEMENTS</subject><subject>CERAMICS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS</subject><subject>CONCRETE</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>LIME, MAGNESIA</subject><subject>METALLURGY</subject><subject>REFRACTORIES</subject><subject>SLAG</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TREATMENT OF NATURAL STONE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBDzj_B0cVUI9vQLcQ1ydVFw9vcNcHQO4WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgaGFgYGhiYGxuaOxsSpAgArZR_r</recordid><startdate>20180207</startdate><enddate>20180207</enddate><creator>KAKENO TAKASHI</creator><creator>KAKUTA KOJI</creator><scope>EVB</scope></search><sort><creationdate>20180207</creationdate><title>OXIDE SINTERED COMPACT</title><author>KAKENO TAKASHI ; KAKUTA KOJI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20180014037A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2018</creationdate><topic>ARTIFICIAL STONE</topic><topic>CEMENTS</topic><topic>CERAMICS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS</topic><topic>CONCRETE</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>LIME, MAGNESIA</topic><topic>METALLURGY</topic><topic>REFRACTORIES</topic><topic>SLAG</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TREATMENT OF NATURAL STONE</topic><toplevel>online_resources</toplevel><creatorcontrib>KAKENO TAKASHI</creatorcontrib><creatorcontrib>KAKUTA KOJI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAKENO TAKASHI</au><au>KAKUTA KOJI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>OXIDE SINTERED COMPACT</title><date>2018-02-07</date><risdate>2018</risdate><abstract>실질적으로 인듐, 주석, 마그네슘 및 산소로 이루어지고, 주석이 Sn/(In + Sn + Mg) 의 원자수 비로 5 ∼ 15 % 의 비율, 마그네슘이 Mg/(In + Sn + Mg) 의 원자수 비로 0.1 ∼ 2.0 % 의 비율로 함유되어 있고, 잔부가 인듐 및 산소로 이루어지는 소결체로서, 상기 소결체의 표면 조도 Ra 가 0.3 ∼ 0.5 ㎛ 일 때의 항절 강도가 140 ㎫ 이상인 것을 특징으로 하는 산화물 소결체. 성막시에 타깃 균열이나 파티클 발생을 저감시킬 수 있음과 함께, 비정질 안정성이나 내구성이 우수한 박막을 형성할 수 있는 스퍼터링 타깃용 산화물 소결체를 제공하는 것을 과제로 한다.
An oxide sintered body substantially formed from indium, tin, magnesium and oxygen, wherein tin is contained at a ratio of 5 to 15% in terms of an atomic ratio of Sn/(In+Sn+Mg), magnesium is contained at a ratio of 0.1 to 2.0% in terms of an atomic ratio of Mg/(In+Sn+Mg), and remainder being indium and oxygen, and wherein a flexural strength of the oxide sintered body is 140 MPa or more when a surface roughness Ra of the oxide sintered body is 0.3 to 0.5 μm. Provided is an oxide sintered body for use as a sputtering target capable of reducing target cracking and particle generation during deposition, and capable of forming a thin film which exhibits superior amorphous stability and durability.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng ; kor |
recordid | cdi_epo_espacenet_KR20180014037A |
source | esp@cenet |
subjects | ARTIFICIAL STONE CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY REFRACTORIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE |
title | OXIDE SINTERED COMPACT |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-06T10%3A49%3A09IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KAKENO%20TAKASHI&rft.date=2018-02-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20180014037A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |