CLEANING APPARATUS OF WAFER

The present invention relates to an apparatus of cleaning a wafer using isopropyl alcohol (IPA). More specifically, the present invention relates to an apparatus of cleaning a wafer which supplies steam to the wafer to preheat the same and supplies the IPA to a pattern surface of the preheated wafer...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	GIMM, DAE HEE
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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