CLEANING APPARATUS OF WAFER

The present invention relates to a device for washing a wafer by using isopropyl alcohol (IPA) and, more specifically, to a wafer washing device which can prevent collapse of a pattern due to surface tension of a washing solution by supplying IPA to wash a pattern surface of a wafer while the wafer...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	GIMM, DAE HEE
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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