APPARATUS FOR CLEANING MASK CAPABLE OF DECIDING EXCHANGE CYCLE OF CLEANING SOLUTION
The present invention relates to a mask cleaning apparatus capable of determining the replacement period of a cleaning solution in real time. According to the present invention, the mask cleaning apparatus includes a monitoring unit which is connected to a drain line for collecting the cleaning solu...
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| creator | HA, JAE UK YUN, YONG WOO KANG, DU SIG |
| description | The present invention relates to a mask cleaning apparatus capable of determining the replacement period of a cleaning solution in real time. According to the present invention, the mask cleaning apparatus includes a monitoring unit which is connected to a drain line for collecting the cleaning solution used for cleaning a mask and quantitatively measures a foreign material concentration among the collected cleaning solutions through a Raman spectrum. The monitoring unit determines the replacement period of the cleaning solution through a Raman shift level of the Raman spectrum measured from the collected cleaning solution to the Raman spectrum measured from an initial cleaning solution, thereby improving the efficiency of the maintenance and management of the cleaning solution used for cleaning the mask.
본 발명은 실시간으로 세정액의 교환 주기의 판정이 가능한 마스크 세정 장치에 관한 것이다. 본 발명에 따르면, 마스크의 세정에 사용된 세정액을 회수하는 드레인 라인에 연결되어 회수되는 세정액 중 이물 농도를 라만 스펙트럼을 통해 정량적으로 측정하는 모니터링부가 구비되며, 상기 모니터링부는 초기 세정액으로부터 측정된 라만 스펙트럼 대비 회수된 세정액으로부터 측정된 라만 스텍프럼의 라만 쉬프트 수준을 통해 상기 세정액의 교환 주기를 판정함으로써 마스크의 세정에 사용되는 세정액의 유지 및 관리의 효율성을 향상시키는 것이 가능하다. |
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본 발명은 실시간으로 세정액의 교환 주기의 판정이 가능한 마스크 세정 장치에 관한 것이다. 본 발명에 따르면, 마스크의 세정에 사용된 세정액을 회수하는 드레인 라인에 연결되어 회수되는 세정액 중 이물 농도를 라만 스펙트럼을 통해 정량적으로 측정하는 모니터링부가 구비되며, 상기 모니터링부는 초기 세정액으로부터 측정된 라만 스펙트럼 대비 회수된 세정액으로부터 측정된 라만 스텍프럼의 라만 쉬프트 수준을 통해 상기 세정액의 교환 주기를 판정함으로써 마스크의 세정에 사용되는 세정액의 유지 및 관리의 효율성을 향상시키는 것이 가능하다.</description><language>eng ; kor</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; CLEANING ; CLEANING IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; COLORIMETRY ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT ; MEASURING ; METALLURGY ; PERFORMING OPERATIONS ; PHYSICS ; PREVENTION OF FOULING IN GENERAL ; RADIATION PYROMETRY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TESTING ; TRANSPORTING</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171213&DB=EPODOC&CC=KR&NR=20170137252A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25551,76302</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171213&DB=EPODOC&CC=KR&NR=20170137252A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HA, JAE UK</creatorcontrib><creatorcontrib>YUN, YONG WOO</creatorcontrib><creatorcontrib>KANG, DU SIG</creatorcontrib><title>APPARATUS FOR CLEANING MASK CAPABLE OF DECIDING EXCHANGE CYCLE OF CLEANING SOLUTION</title><description>The present invention relates to a mask cleaning apparatus capable of determining the replacement period of a cleaning solution in real time. According to the present invention, the mask cleaning apparatus includes a monitoring unit which is connected to a drain line for collecting the cleaning solution used for cleaning a mask and quantitatively measures a foreign material concentration among the collected cleaning solutions through a Raman spectrum. The monitoring unit determines the replacement period of the cleaning solution through a Raman shift level of the Raman spectrum measured from the collected cleaning solution to the Raman spectrum measured from an initial cleaning solution, thereby improving the efficiency of the maintenance and management of the cleaning solution used for cleaning the mask.
본 발명은 실시간으로 세정액의 교환 주기의 판정이 가능한 마스크 세정 장치에 관한 것이다. 본 발명에 따르면, 마스크의 세정에 사용된 세정액을 회수하는 드레인 라인에 연결되어 회수되는 세정액 중 이물 농도를 라만 스펙트럼을 통해 정량적으로 측정하는 모니터링부가 구비되며, 상기 모니터링부는 초기 세정액으로부터 측정된 라만 스펙트럼 대비 회수된 세정액으로부터 측정된 라만 스텍프럼의 라만 쉬프트 수준을 통해 상기 세정액의 교환 주기를 판정함으로써 마스크의 세정에 사용되는 세정액의 유지 및 관리의 효율성을 향상시키는 것이 가능하다.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>COLORIMETRY</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT</subject><subject>MEASURING</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>RADIATION PYROMETRY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TESTING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAh2DAhwDHIMCQ1WcPMPUnD2cXX08_RzV_B1DPZWcHYMcHTycVXwd1NwcXX2dAFJuEY4ezj6ubsqOEc6Q6TgeoL9fUJDPP39eBhY0xJzilN5oTQ3g7Kba4izh25qQX58anFBYnJqXmpJvHeQkYGhuYGhsbmRqZGjMXGqAHX1MDE</recordid><startdate>20171213</startdate><enddate>20171213</enddate><creator>HA, JAE UK</creator><creator>YUN, YONG WOO</creator><creator>KANG, DU SIG</creator><scope>EVB</scope></search><sort><creationdate>20171213</creationdate><title>APPARATUS FOR CLEANING MASK CAPABLE OF DECIDING EXCHANGE CYCLE OF CLEANING SOLUTION</title><author>HA, JAE UK ; YUN, YONG WOO ; KANG, DU SIG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20170137252A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2017</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>COLORIMETRY</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT</topic><topic>MEASURING</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>RADIATION PYROMETRY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TESTING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>HA, JAE UK</creatorcontrib><creatorcontrib>YUN, YONG WOO</creatorcontrib><creatorcontrib>KANG, DU SIG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HA, JAE UK</au><au>YUN, YONG WOO</au><au>KANG, DU SIG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APPARATUS FOR CLEANING MASK CAPABLE OF DECIDING EXCHANGE CYCLE OF CLEANING SOLUTION</title><date>2017-12-13</date><risdate>2017</risdate><abstract>The present invention relates to a mask cleaning apparatus capable of determining the replacement period of a cleaning solution in real time. According to the present invention, the mask cleaning apparatus includes a monitoring unit which is connected to a drain line for collecting the cleaning solution used for cleaning a mask and quantitatively measures a foreign material concentration among the collected cleaning solutions through a Raman spectrum. The monitoring unit determines the replacement period of the cleaning solution through a Raman shift level of the Raman spectrum measured from the collected cleaning solution to the Raman spectrum measured from an initial cleaning solution, thereby improving the efficiency of the maintenance and management of the cleaning solution used for cleaning the mask.
본 발명은 실시간으로 세정액의 교환 주기의 판정이 가능한 마스크 세정 장치에 관한 것이다. 본 발명에 따르면, 마스크의 세정에 사용된 세정액을 회수하는 드레인 라인에 연결되어 회수되는 세정액 중 이물 농도를 라만 스펙트럼을 통해 정량적으로 측정하는 모니터링부가 구비되며, 상기 모니터링부는 초기 세정액으로부터 측정된 라만 스펙트럼 대비 회수된 세정액으로부터 측정된 라만 스텍프럼의 라만 쉬프트 수준을 통해 상기 세정액의 교환 주기를 판정함으로써 마스크의 세정에 사용되는 세정액의 유지 및 관리의 효율성을 향상시키는 것이 가능하다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING CLEANING IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COLORIMETRY DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING METALLURGY PERFORMING OPERATIONS PHYSICS PREVENTION OF FOULING IN GENERAL RADIATION PYROMETRY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING TRANSPORTING |
| title | APPARATUS FOR CLEANING MASK CAPABLE OF DECIDING EXCHANGE CYCLE OF CLEANING SOLUTION |
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