Composition for forming organic anti-reflective coating layer suitable for negative tone development

Disclosed is a composition for forming an organic anti-reflective film used in a negative tone development, which has a high refractive index and etch rate, enhances adhesion to a photoresist, and has improved pattern profiles including an undercut. The composition of the present invention comprises...

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Bibliographische Detailangaben

Hauptverfasser:	KIM, SEUNG JIN, KIM, JI HYUN, KIM, HYUN JIN, ROH, HYO JUNG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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