Leak detection method and apparatus of chamber

Disclosed are a method of detecting leakage of a chamber, and a device for the same. According to the present invention, the method of detecting leakage of the chamber is able to rapidly detect leakage of the chamber without influencing a semiconductor process. The method to detect leakage of the ch...

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Bibliographische Detailangaben
Hauptverfasser:	LEE, SOON JONG, WOO, BONG JOO, LEE, DONG SEOK, YU, IM SOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS SEMICONDUCTOR DEVICES TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	Disclosed are a method of detecting leakage of a chamber, and a device for the same. According to the present invention, the method of detecting leakage of the chamber is able to rapidly detect leakage of the chamber without influencing a semiconductor process. The method to detect leakage of the chamber comprises: a step of performing a plasma reaction after a cleaning process of the chamber; and a step of detecting leakage of the chamber by analyzing the plasma reaction. The leakage is detected before a next semiconductor process starts after the cleaning process. 챔버의 리크 검출 방법 그 장치가 개시된다. 챔버의 리크를 검출하는 방법은, 상기 챔버의 클리닝 공정 후 플라즈마 반응시키는 단계; 및 상기 플라즈마 반응을 분석하여 상기 챔버의 리크를 검출하는 단계를 포함한다.