PEDOT/PSS WATER-SOLUBLE DIACETYLENE MONOMER COMPOSITION FOR PHOTOLITHOGRAPHY CONTAINING WATER-SOLUBLE DIACETYLENE MONOMER AND PEDOT/PSS CONDUCTIVE POLYMERS AND METHOD FOR PREPARING MICROPATTERN USING THE SAME

The present invention relates to a novel water-soluble diacetylene monomer compound, a composition for photolithography containing the water-soluble diacetylene monomer compound and a PEDOT/PSS conductive polymer, and a method for preparing a micro-pattern by using the same. More specifically, the p...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, TAE GEUN, LEE, CHAN WOO, KIM, JONG MAN, UH, KYUNG CHAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to a novel water-soluble diacetylene monomer compound, a composition for photolithography containing the water-soluble diacetylene monomer compound and a PEDOT/PSS conductive polymer, and a method for preparing a micro-pattern by using the same. More specifically, the present invention relates to: a novel water-soluble diacetylene monomer compound which does not generate a coagulation phenomenon even when being mixed with PEDOT/PSS which is a water soluble conductive polymer; a composition for photolithography containing the water-soluble diacetylene monomer compound and the PEDOT/PSS conductive polymer; and a method for preparing a micro-pattern by using the same. According to the present invention, the novel water-soluble diacetylene monomer compound, which does not generate the coagulation phenomenon even when being mixed with PEDOT/PSS, a water soluble conductive polymer, can be provided. Accordingly, the composition for uniform photolithography can be prepared by mixing the PEDOT/PSS and the diacetylene monomer, and the micro-pattern can be prepared by using the same. More specifically, when a thin film is prepared by using the composition and then is irradiated with light, only a portion is selectively cross-linked by a photopolymerization reaction of the diacetylene monomer. Accordingly, an insoluble engraved-type micro-pattern can be obtained. 본 발명은 신규의 수용성 다이아세틸렌 단량체 화합물, 상기 수용성 다이아세틸렌 단량체 화합물과 PEDOT/PSS 전도성 고분자를 포함하는 광미세가공용 조성물 및 이를 이용한 마이크로 패턴의 제조방법에 관한 것으로, 더욱 상세하게는 수용성 전도성 고분자 PEDOT/PSS와 혼합하여도 응집현상이 일어나지 않는 신규의 수용성 다이아세틸렌 단량체 화합물, 상기 수용성 다이아세틸렌 단량체 화합물과 PEDOT/PSS 전도성 고분자를 포함하는 광미세가공용 조성물 및 이를 이용한 마이크로 패턴의 제조방법에 관한 것이다. 본 발명에 따르면, 수용성 전도성 고분자 PEDOT/PSS와 혼합하여도 응집현상이 일어나지 않는 신규의 수용성 다이아세틸렌 단량체를 제공할 수 있다. 이에 따라 PEDOT/PSS와 상기 다이아세틸렌 단량체를 혼합하여 균일한 광미세가공용 조성물의 제조가 가능하고 이를 이용하여 마이크로 패턴을 제조할 수 있다. 더욱 구체적으로 상기 조성물을 이용하여 박막을 제조한 후 빛을 조사하면 다이아세틸렌 단량체의 광중합 반응으로 빛을 받은 부분만 선택적으로 가교되어 불용성의 음각형 마이크로 패턴을 얻을 수 있다.