N2O Scrubber for removing N2O contained in the waste gas

The present invention relates to a scrubber for reducing N_2O in a waste gas occurring in the electronic industry. The scrubber is a device to which a reduced or decomposed catalyst. The device comprises: a heating unit for feeding and heating a waste gas occurring during a process; and a reacting u...

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Bibliographische Detailangaben
Hauptverfasser: KWON, WON TAE, YANG, CHANG HEE, KHA, MYOUNG JIN, KIM, JIN YOUNG, KIM, HYUN HO, KIM, DAE SU, PARK, WAN KEUN, NOH, HAK JAE, CHANG, WON CHUL, LEE, MIN WOO
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:The present invention relates to a scrubber for reducing N_2O in a waste gas occurring in the electronic industry. The scrubber is a device to which a reduced or decomposed catalyst. The device comprises: a heating unit for feeding and heating a waste gas occurring during a process; and a reacting unit for making the waste gas reacted with a catalyst. The device is a scrubber for reducing N_2O and NO_x which are difficult to be reduced through a pyrolyzing method, a combusting method, and a plasma method which are scrubber methods usually used in the electronic industry. An occurring waste gas has various phases, but targets are N_2O- and NO_x-based gases occurring after pyrolyzing ammonia occurring during a process and N_2O and NO_x occurring by combustion and plasma treatment of a material containing an N component among F-component gases. It is suitable that an applied reducing catalyst material comprises: 35 to 55 wt% of a zeolite component; 40 to 65 wt% of a water content; 0.1 to 5.0 wt% of Fe; 0.1 to 10 wt% of an organic binder component; and 0.1 to 10 wt% of an inorganic binder component. It is possible that the form of an applied catalyst is a pellet, a honeycomb, a plate, or the like. Moreover, a low temperature region decomposition catalyst material can be applied with respect to K/CoCe. 본 발명은 전자산업에서 발생하는 폐가스 내 NO를 저감시키기 위한 스크러버로서, 환원 또는 분해 촉매를 적용한 장치 관한 것이다. 본 장치는 크게 공정상에서 발생되는 폐가스가 유입되어 가열되는 가열부, 폐가스가 촉매와 반응하는 반응부로 구성된다. 본 장치는 전자산업 분야에서 주로 사용하는 스크러버 방식인 열분해방식, 연소방식, 플라즈마방식으로 저감이 어려운 NO 및 NO을 제거하기 위한 스크러버이다. 발생되는 폐가스의 성상은 다양하지만, 공정에서 발생한 암모니아를 열분해한 후 발생하는 NO 및 NO계열과 F-성분 가스 중 N 성분을 함유한 물질의 연소 및 플라즈마 처리에 의해 발생하는 NO 및 NO이 대상이다. 적용되는 환원촉매 물질은 제올라이트 성분이 35 내지 55 중량%, 수분 함량은 40 내지 65 중량%, Fe는 0.1 내지 5.0 중량%, 유기바인더 성분은 0.1 내지 10 중량%, 무기바인더 성분은 0.1 내지 10 중량% 해당하는 범위의 촉매가 적합하며 적용되는 촉매의 형태는 펠렛, 허니컴, 플레이트 등이 가능하다. 또한 저온영역 분해 촉매물질은 K/CoCe 적용이 가능하다.