STRIPPING COMPOSITIONS FOR PHOTORESIST

The present invention provides a photoresist stripping composition comprising cyclodextrin or a derivative thereof. According to the present invention, a stripping liquid composition which is excellent in peeling performance against photoresist and corrosion resistance against metal wiring can be pr...

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Bibliographische Detailangaben
Hauptverfasser:	KANG, JOO WON, KIM, BOO KYUNG, JO, YONG JEONG, IM, CHEOL SUN, AHN, SANG YEOB, JEON, SU ZY, PARK, JI HYANG, JEONG, BYOUNG HYUN, LEE, DAE WON, YOO, CHUNG YOUL, HEO, SUN HEE, LEE, SANG SEOP, KIM, JUN HWAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY CINEMATOGRAPHY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FATTY ACIDS THEREFROM HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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