STRIPPING COMPOSITIONS FOR PHOTORESIST
The present invention provides a photoresist stripping composition comprising cyclodextrin or a derivative thereof. According to the present invention, a stripping liquid composition which is excellent in peeling performance against photoresist and corrosion resistance against metal wiring can be pr...
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Format: | Patent |
Sprache: | eng ; kor |
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Zusammenfassung: | The present invention provides a photoresist stripping composition comprising cyclodextrin or a derivative thereof. According to the present invention, a stripping liquid composition which is excellent in peeling performance against photoresist and corrosion resistance against metal wiring can be provided, and an environmentally friendly stripping liquid having less harmfulness to human body and environment can also be provided.
본 발명은 시클로덱스트린 또는 그 유도체를 포함하는 포토레지스트 박리액 조성물을 제공한다. 이러한 본 발명에 따르면, 포토레지스트에 대한 박리성능 및 금속배선에 대한 내부식성이 우수한 박리액 조성물을 제공할 수 있을 뿐만 아니라, 인체 및 환경에 대한 유해성이 적은 친환경적인 박리액을 제공할 수 있다. |
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