A method and system for measuring plasma density using capacitance and a prove therefor

As a process using plasma is expanded not only in semiconductors, displays, and solar cells but also in bio-fields using atmospheric plasma, the accurate diagnosis of the plasma is required. A method directly using a probe and a method using plasma emission light which are existing plasma diagnosis...

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Bibliographische Detailangaben
Hauptverfasser: YUN, MYOUNG SOO, JO, TAE HOON, PARK, HYE JIN, CHOI, JIN WOO, KWON, GI CHUNG
Format: Patent
Sprache:eng ; kor
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