POLISHING COMPOSITION POLISHING METHOD AND METHOD FOR MANUFACTURING CERAMIC COMPONENT

저렴하며 또한 세라믹에 대해 고품위의 경면 마무리를 행할 수 있는 연마용 조성물을 제공한다. 연마용 조성물은, 지립을 함유하고, pH가 6.0 이상 9.0 이하이고, 세라믹을 연마하기 위하여 사용된다. Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives, has a pH of 6.0 or mo...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	HISHIDA SHOTA, TAMAI KAZUSEI, OTSUKI SHINGO, ASANO HIROSHI, ITO YUUICHI, ASAI MAIKO, IKEDO TOMOYA
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	저렴하며 또한 세라믹에 대해 고품위의 경면 마무리를 행할 수 있는 연마용 조성물을 제공한다. 연마용 조성물은, 지립을 함유하고, pH가 6.0 이상 9.0 이하이고, 세라믹을 연마하기 위하여 사용된다. Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives, has a pH of 6.0 or more to 9.0 or less, and is used for polishing ceramic.