Ellipsometer and method of inspecting pattern asymmetry using the same

본 발명은 미리 설정된 특정 각도에 해당하는 회전 간격에 따라서 미리 설정된 회전구간 내에서 회전이 가능한 스테이지를 구비한 분광 타원계측기를 제공함으로써 반도체 소자의 패턴들의 비대칭성의 정도 및 방향을 측정할 수 있는 장치 및 그러한 측정 방법을 제공한다. An ellipsometer includes a stage, a light source, a polarizer, a detector, and a processor. The stage is configured to support a substrate including a pat...

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Bibliographische Detailangaben
Hauptverfasser:	JUN, CHUNG SAM, LEEM, CHOON SHIK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21Sand F21V, RELATING TO USESOR APPLICATIONS OF LIGHTING DEVICES OR SYSTEMS LIGHTING MEASURING MEASURING ELECTRIC VARIABLES MEASURING MAGNETIC VARIABLES MECHANICAL ENGINEERING NON-PORTABLE LIGHTING DEVICES PHYSICS SEMICONDUCTOR DEVICES SYSTEMS THEREOF TESTING VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLEEXTERIORS WEAPONS
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