COUNTER FLOW MIXER FOR PROCESS CHAMBER

Disclosed is a backflow mixing device for processing chambers, which includes an injection pipe for introducing a fluid in an opposite direction to flow of a post-plasma gas mixture which moves downwards from a plasma source. According to the present invention, re-bonding between the produced ions a...

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Bibliographische Detailangaben
Hauptverfasser:	STUMPF JOHN F, WUESTER CHRIS
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	Disclosed is a backflow mixing device for processing chambers, which includes an injection pipe for introducing a fluid in an opposite direction to flow of a post-plasma gas mixture which moves downwards from a plasma source. According to the present invention, re-bonding between the produced ions and radicals can be avoided, and favorable mixing for the fluid is possible. 플라즈마 소스로부터 아래쪽으로 이동하는 포스트-플라즈마 가스 혼합물의 흐름에 반대방향인 방식으로 유체를 도입하는 인젝션 관을 포함하는, 프로세싱 챔버를 위한 역류 혼합 디바이스가 개시된다. 본 발명은 발생된 이온들 및 라디칼들의 재결합을 피하는 것뿐만 아니라 유체의 적절한 혼합을 가능하게 한다.