Dissolved ozone removal unit and Apparatus for treating a substrate including the unit Method for removing a dissolved ozone Method for cleaning a substrate
The present invention relates to a dissolved ozone removing unit for removing dissolved ozone in liquid, a substrate treating device including the same, a dissolved ozone removing method, and a substrate cleaning method. According to an embodiment of the present invention, the dissolved ozone removi...
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| creator | BANG, BYUNG SUN YOUN, JUN HEE KWON, KIL SUNG |
| description | The present invention relates to a dissolved ozone removing unit for removing dissolved ozone in liquid, a substrate treating device including the same, a dissolved ozone removing method, and a substrate cleaning method. According to an embodiment of the present invention, the dissolved ozone removing method in the liquid comprises: supplying microbubbles into the liquid; and discharging the dissolved ozone to the outside of the liquid with the energy or radical ion generated as the microbubbles dissolve in the liquid. The present invention supplies the microbubbles in the liquid to remove dissolved ozone in the liquid.
본 발명은 액체 내에 용존 오존을 제거하는 용존 오존 제거 유닛 및 이를 포함하는 기판 처리 장치, 용존 오존 제거 방법, 기판 세정 방법에 관한 것이다. 본 발명의 일 실시 예에 따른, 액체 내에 용존 오존을 제거하는 방법은 상기 액체 내에 마이크로버블을 공급하고, 상기 마이크로버블이 상기 액체 내에 용해되면서 발생되는 에너지 또는 라디칼 이온으로 상기 용존 오존을 상기 액체 외부로 빠져 나가도록 제공되는 용존 오존 제거 방법을 포함한다. |
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본 발명은 액체 내에 용존 오존을 제거하는 용존 오존 제거 유닛 및 이를 포함하는 기판 처리 장치, 용존 오존 제거 방법, 기판 세정 방법에 관한 것이다. 본 발명의 일 실시 예에 따른, 액체 내에 용존 오존을 제거하는 방법은 상기 액체 내에 마이크로버블을 공급하고, 상기 마이크로버블이 상기 액체 내에 용해되면서 발생되는 에너지 또는 라디칼 이온으로 상기 용존 오존을 상기 액체 외부로 빠져 나가도록 제공되는 용존 오존 제거 방법을 포함한다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170510&DB=EPODOC&CC=KR&NR=20170048786A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170510&DB=EPODOC&CC=KR&NR=20170048786A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BANG, BYUNG SUN</creatorcontrib><creatorcontrib>YOUN, JUN HEE</creatorcontrib><creatorcontrib>KWON, KIL SUNG</creatorcontrib><title>Dissolved ozone removal unit and Apparatus for treating a substrate including the unit Method for removing a dissolved ozone Method for cleaning a substrate</title><description>The present invention relates to a dissolved ozone removing unit for removing dissolved ozone in liquid, a substrate treating device including the same, a dissolved ozone removing method, and a substrate cleaning method. According to an embodiment of the present invention, the dissolved ozone removing method in the liquid comprises: supplying microbubbles into the liquid; and discharging the dissolved ozone to the outside of the liquid with the energy or radical ion generated as the microbubbles dissolve in the liquid. The present invention supplies the microbubbles in the liquid to remove dissolved ozone in the liquid.
본 발명은 액체 내에 용존 오존을 제거하는 용존 오존 제거 유닛 및 이를 포함하는 기판 처리 장치, 용존 오존 제거 방법, 기판 세정 방법에 관한 것이다. 본 발명의 일 실시 예에 따른, 액체 내에 용존 오존을 제거하는 방법은 상기 액체 내에 마이크로버블을 공급하고, 상기 마이크로버블이 상기 액체 내에 용해되면서 발생되는 에너지 또는 라디칼 이온으로 상기 용존 오존을 상기 액체 외부로 빠져 나가도록 제공되는 용존 오존 제거 방법을 포함한다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjb0KwkAQhNNYiPoOC9bC-YNJG_xBEBuxD2tuYw7Ou-NuL4XP4sOqiYWkshqYmW9mmDy3KgSrG5JgH9YQeLrbBjVEoxjQSMidQ48cA1TWA3tCVuYGCCFeA78TAmVKHeXH5Zo68kRcW9ki7WKHyN7ZT6vUhKY3PE4GFepAk6-Okul-d9kcZuRsQcFhSYa4OJ4XYp4KscrSbJ0v_2u9AE8ZVPc</recordid><startdate>20170510</startdate><enddate>20170510</enddate><creator>BANG, BYUNG SUN</creator><creator>YOUN, JUN HEE</creator><creator>KWON, KIL SUNG</creator><scope>EVB</scope></search><sort><creationdate>20170510</creationdate><title>Dissolved ozone removal unit and Apparatus for treating a substrate including the unit Method for removing a dissolved ozone Method for cleaning a substrate</title><author>BANG, BYUNG SUN ; YOUN, JUN HEE ; KWON, KIL SUNG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20170048786A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2017</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>BANG, BYUNG SUN</creatorcontrib><creatorcontrib>YOUN, JUN HEE</creatorcontrib><creatorcontrib>KWON, KIL SUNG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BANG, BYUNG SUN</au><au>YOUN, JUN HEE</au><au>KWON, KIL SUNG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Dissolved ozone removal unit and Apparatus for treating a substrate including the unit Method for removing a dissolved ozone Method for cleaning a substrate</title><date>2017-05-10</date><risdate>2017</risdate><abstract>The present invention relates to a dissolved ozone removing unit for removing dissolved ozone in liquid, a substrate treating device including the same, a dissolved ozone removing method, and a substrate cleaning method. According to an embodiment of the present invention, the dissolved ozone removing method in the liquid comprises: supplying microbubbles into the liquid; and discharging the dissolved ozone to the outside of the liquid with the energy or radical ion generated as the microbubbles dissolve in the liquid. The present invention supplies the microbubbles in the liquid to remove dissolved ozone in the liquid.
본 발명은 액체 내에 용존 오존을 제거하는 용존 오존 제거 유닛 및 이를 포함하는 기판 처리 장치, 용존 오존 제거 방법, 기판 세정 방법에 관한 것이다. 본 발명의 일 실시 예에 따른, 액체 내에 용존 오존을 제거하는 방법은 상기 액체 내에 마이크로버블을 공급하고, 상기 마이크로버블이 상기 액체 내에 용해되면서 발생되는 에너지 또는 라디칼 이온으로 상기 용존 오존을 상기 액체 외부로 빠져 나가도록 제공되는 용존 오존 제거 방법을 포함한다.</abstract><oa>free_for_read</oa></addata></record> |
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| title | Dissolved ozone removal unit and Apparatus for treating a substrate including the unit Method for removing a dissolved ozone Method for cleaning a substrate |
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