Deposition method capable of controlling process temperature

The present invention relates to a deposition method and, more specifically, to a deposition method which facilitates temperature control of a deposition process to obtain an advantage in low temperature deposition, which increases cooling efficiency of a sample, a deposition target, to enable depos...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JUNG, SUNG HUN, AN, KYOUNG JOON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
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