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The present invention is to provide a method which mitigates an electrostatic defect occurring after a cell area unit cutting process. To this end, the present invention forms, as an electrostatic derivative, a dummy structure composed of at least a part of a structure transferring a test signal to...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHOI, SUN HYUN, ROH, TAE YUN, SHIN, KI TAEG
Format: Patent
Sprache:eng ; kor
Schlagworte:
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