PLASMA PROCESSING APPARATUS

The present invention provides a plasma processing apparatus having a high reliability and an improved yield rate. The plasma processing apparatus includes a processing chamber disposed in the interior of a vacuum container and of which a pressure may be reduced, a sample die disposed in the process...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ICHINO TAKAMASA, YOKOGAWA KENETSU, OHMOTO YUTAKA, TANDOU TAKUMI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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