USE OF PLASMA-RESISTANT ATOMIC LAYER DEPOSITION COATINGS TO EXTEND THE LIFETIME OF POLYMER COMPONENTS IN ETCH CHAMBERS
According to the disclosure, several inventions are provided, including an apparatus and a method for depositing plasma-resistant coatings on polymeric materials used in a plasma processing chamber. In a particular example, such coating may be performed on a part of an electrostatic chuck. Here, the...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | eng ; kor |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | According to the disclosure, several inventions are provided, including an apparatus and a method for depositing plasma-resistant coatings on polymeric materials used in a plasma processing chamber. In a particular example, such coating may be performed on a part of an electrostatic chuck. Here, the polymer material is a bead surrounding an adhesive between a chuck base and a top plate of ceramic. So, the lifetime of polymer components can be extended.
이 개시에 따르면, 플라즈마 프로세싱 챔버 내에서 사용되는 폴리머 재료들 상에 플라즈마 내성 코팅들을 증착하기 위한 장치 및 방법을 포함한, 몇몇의 발명들이 제공된다. 특정한 예에서, 이러한 코팅은 정전 척의 일부분 상에 행해질 수도 있고, 여기서 폴리머 재료는 척 베이스와 세라믹 상단 플레이트 사이의 접착제를 둘러싸는 비드이다. |
---|