USE OF PLASMA-RESISTANT ATOMIC LAYER DEPOSITION COATINGS TO EXTEND THE LIFETIME OF POLYMER COMPONENTS IN ETCH CHAMBERS

According to the disclosure, several inventions are provided, including an apparatus and a method for depositing plasma-resistant coatings on polymeric materials used in a plasma processing chamber. In a particular example, such coating may be performed on a part of an electrostatic chuck. Here, the...

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Bibliographische Detailangaben
Hauptverfasser: STEVENSON THOMAS R, KERNS JOHN MICHAEL, XU LIN, ANDERSON NASH W, DAUGHERTY JOHN
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:According to the disclosure, several inventions are provided, including an apparatus and a method for depositing plasma-resistant coatings on polymeric materials used in a plasma processing chamber. In a particular example, such coating may be performed on a part of an electrostatic chuck. Here, the polymer material is a bead surrounding an adhesive between a chuck base and a top plate of ceramic. So, the lifetime of polymer components can be extended. 이 개시에 따르면, 플라즈마 프로세싱 챔버 내에서 사용되는 폴리머 재료들 상에 플라즈마 내성 코팅들을 증착하기 위한 장치 및 방법을 포함한, 몇몇의 발명들이 제공된다. 특정한 예에서, 이러한 코팅은 정전 척의 일부분 상에 행해질 수도 있고, 여기서 폴리머 재료는 척 베이스와 세라믹 상단 플레이트 사이의 접착제를 둘러싸는 비드이다.