Quantum Dot Composition Including the Same and Method of Preparing Quantum Dot

Provided is a quantum dot passivated with oligomers or polymers formed by reaction of a first monomer having three or more thiol groups (-SH) at the end thereof and a second monomer containing two or more functional groups reacting with the thiol group at the end and a spacer group placed between th...

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Bibliographische Detailangaben
Hauptverfasser:	WOO, HEE JE, KONG, EUI HYUN, LEE, JUN WOO, YOUN, JIN SUOP, KWON, O BUM, PARK, SANG CHEON, PARK, ON YOU, KIM, JONG GI, CHO SUNG SEO, HAN, HYUN JOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ADHESIVES CHEMISTRY DYES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES
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Beschreibung
Zusammenfassung:	Provided is a quantum dot passivated with oligomers or polymers formed by reaction of a first monomer having three or more thiol groups (-SH) at the end thereof and a second monomer containing two or more functional groups reacting with the thiol group at the end and a spacer group placed between the functional groups. The quantum dot has excellent stability to oxygen and moisture, thermal stability and light stability, and excellent dispersibility to matrix resin or a solvent used in manufacturing a film by effective passivation on the surface of the quantum dot. 말단에 3개 이상의 티올기(-SH)를 가지는 제1 모노머 및 말단에 상기 티올기와 반응할 수 있는 2개 이상의 작용기(functional group)와 상기 2개 이상의 작용기 사이에 위치하는 스페이서기(spacer group)를 포함하는 제2 모노머를 반응시켜 형성된 올리고머 또는 폴리머로 패시베이션(passivation)된 양자점을 제공한다.