apparatus for manufacturing a substrate and ceramic film coating method of the same

apparatus for manufacturing a substrate and ceramic film coating method of the same

The present invention discloses a substrate manufacturing apparatus and a ceramic thin film coating method thereof. The apparatus includes a chamber and a ceramic thin film on the inner wall of the chamber. The ceramic thin film includes a yttrium oxygen fluoride film (Y_xO_yF_z, x=1, y=1, 2, z=1, 2...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: KANG, TAE KYUN, OH, SE JIN, BANG, JIN YOUNG, PARK, MYOUNG SOO, KIM, JUNG MIN, SUNG, DOUG YONG
Format: Patent
Sprache:eng ; kor
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The present invention discloses a substrate manufacturing apparatus and a ceramic thin film coating method thereof. The apparatus includes a chamber and a ceramic thin film on the inner wall of the chamber. The ceramic thin film includes a yttrium oxygen fluoride film (Y_xO_yF_z, x=1, y=1, 2, z=1, 2). 본 발명은 기판 제조 장치 및 그의 세라믹 박막의 코팅 방법을 개시한다. 그의 장치는 챔버와, 상기 챔버의 내벽 상의 세라믹 박막을 포함한다. 상기 세라믹 박막은 이트륨 산소 불화막(YOF, x=1, y=1, 2, z=1, 2)을 포함할 수 있다.