METHOD FOR A VARIETY METAL BONDING ON PRECIOUS METALS SPUTTERING TARGET DECREASE RAW MATERIALS AND THE SPUTTERING TARGET PREPARED THEREBY

The present invention relates to a sputtering target which reduces a usage of precious metal using a three-dimensional profile of a waste precious metal target used for a sputtering process, and a manufacturing method thereof. The manufacturing method of the sputtering target comprises: (i) a step o...

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Bibliographische Detailangaben
Hauptverfasser:	KWON, OH JIB, YANG, SEUNG HO, YOON, WON KYU, HONG, GIL SOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAKING METALLIC POWDER MANUFACTURE OF ARTICLES FROM METALLIC POWDER METALLURGY PERFORMING OPERATIONS POWDER METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING WORKING METALLIC POWDER
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Beschreibung
Zusammenfassung:	The present invention relates to a sputtering target which reduces a usage of precious metal using a three-dimensional profile of a waste precious metal target used for a sputtering process, and a manufacturing method thereof. The manufacturing method of the sputtering target comprises: (i) a step of profiling a consumption part of a waste sputtering target in three-dimensional; (ii) a step of manufacturing a forming mold and a sintering mold; (iii) a step of filling the forming mold with precious metal powder to form a formed body; (iv) a step of pressing and heating the formed body to form a sintered body; and (v) a step of forming a first dissimilar metal layer on one surface of the sintered body, and flattening the other surface of the first dissimilar metal layer. 본 발명은 스퍼터링 공정에 사용된 귀금속 폐타겟의 3차원 프로파일을 이용하여, 귀금속 사용량이 저감된 스퍼터링 타겟 및 그 제조방법에 관한 것이다.