GAS SUPPLY CONTROL METHOD FOR SUBSTRATE PROCESSING APPARATUS

The present invention relates to a substrate treatment apparatus, and more specifically, to a gas supply control method for a substrate treatment apparatus which deposits a thin film on a substrate by the supply of first gas and second gas. According to the present invention, the gas supply control...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NOH, IL HO, KIM, BEOM JUN, BANG, SEUNG DUK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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