POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR PRODUCTION OF MICROLENS PATTERN

The present invention relates to a positive-type photosensitive resin composition for use in the formation of microlens patterns, having desirable resolution and wide flow margin, a method for fabricating a microlens pattern using the same, and a method for producing a microlens. The positive-type p...

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Bibliographische Detailangaben
Hauptverfasser:	ISOBE SHINGO, MATSUMOTO NAOZUMI, INOUE TOMOYUKI, TAKAHASHI KAZUKI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to a positive-type photosensitive resin composition for use in the formation of microlens patterns, having desirable resolution and wide flow margin, a method for fabricating a microlens pattern using the same, and a method for producing a microlens. The positive-type photosensitive resin composition for use in the formation of microlens patterns, comprises: a resin (A) which has an acid dissociable dissolution inhibiting group and whose solubility in a base increases through the action of acid; a compound (B) having at least 2 vinyloxy groups; and a photo acid generator (C), wherein the resin (A) includes a resin (A1) that includes a repeating unit (a1) which is derived from hydroxystyrene and a repeating unit (a2) derived from hydroxystyrene having a hydrogen atom in at least one hydroxyl group is substituted with an acid dissociable dissolution inhibiting group. [과제]뛰어난 해상성 및 넓은 플로우 마진의 모두를 구비한 마이크로 렌즈 패턴 제조용 포지티브형 감광성 수지 조성물 및 그것을 이용한 마이크로 렌즈 패턴의 제조 방법 및 마이크로 렌즈의 제조 방법을 제공한다. [해결 수단]본 발명에 관한 마이크로 렌즈 패턴 제조용 포지티브형 감광성 수지 조성물은 산해리성 용해 억제기를 가지고, 산의 작용에 의해 알칼리에 대한 용해성이 증대하는 수지(A)와, 적어도 2개의 비닐옥시기를 가지는 화합물(B)과, 광산발생제(C)를 함유하며, 상기 수지(A)는 히드록시스티렌으로부터 유도되는 구성 단위(a1)와, 히드록시스티렌으로부터 유도되는 구성 단위에서 적어도 1개의 수산기의 수소 원자가 산해리성 용해 억제기 함유기로 치환된 구성 단위(a2)를 가지는 수지(A1)를 포함한다.