HARD MASK COMPOSITION FOR SPIN COATING

The present invention relates to a hard mask composition for spin coating, and more specifically, provides a hard mask composition for spin coating, containing: a graphene copolymer; and a solvent. The hard mask composition of the present invention has excellent etching resistance, thereby allowing...

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Bibliographische Detailangaben
Hauptverfasser:	YU, NAE RY, KIM, BOO DEUK, CHOI, JUNG SIK, YI, SONG SE, KIM, JUNG HOON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The present invention relates to a hard mask composition for spin coating, and more specifically, provides a hard mask composition for spin coating, containing: a graphene copolymer; and a solvent. The hard mask composition of the present invention has excellent etching resistance, thereby allowing etching at an increased aspect ratio even with a thin mask. Since even the thin hard mask is sufficient, the hard mask composition of the present invention can ensure sufficient transparency and thus is advantageous in key alignment, and have low material costs and thus is economical. 본 발명은 스핀 코팅용 하드 마스크 조성물에 관한 것으로서, 보다 구체적으로는 그래핀(graphene) 공중합체; 및 용매를 포함하는 스핀 코팅용 하드 마스크 조성물을 제공한다. 본 발명의 하드마스크 조성물은 에칭 내성이 우수하여 얇은 두께의 마스크로도 증대된 종횡비의 식각이 가능하다. 얇은 두께의 하드마스크로 충분하기 때문에 충분한 투명성을 확보할 수 있어 키 얼라인먼트에 유리하고, 재료비가 적게 들어 경제적이다.