TRANSPARENT GAS BARRIER FILM AND METHOD FOR MANUFACTURING TRANSPARENT GAS BARRIER FILM

According to the present invention, disclosed are a transparent gas barrier film and a method to manufacture the transparent gas barrier film. According to an aspect of the present invention, the transparent gas barrier film comprises: a base substrate; a first and a second barrier layer placed on a...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: KIM, KYUNG KAK, KIM, TAE HYUN, SHIN, CHUNG HWAN
Format: Patent
Sprache:eng ; kor
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:According to the present invention, disclosed are a transparent gas barrier film and a method to manufacture the transparent gas barrier film. According to an aspect of the present invention, the transparent gas barrier film comprises: a base substrate; a first and a second barrier layer placed on an upper portion of the base substrate to perform a barrier layer, made of an inorganic film; and a metal layer placed between the first barrier layer and the second barrier layer. The metal layer is made of copper (Cu). 본 발명은 투명 가스 배리어성 필름 및 이를 제조하는 방법을 개시한다. 본 발명의 일 측면에 따른 투명 가스 배리어성 필름은, 베이스 기재; 상기 베이스 기재의 상부에 위치하여 배리어층 역할을 하는 무기막으로 이루어진 제 1, 2 배리어층; 및 상기 제 1, 2 배리어층의 사이에 위치하는 금속층;을 포함하고, 상기 금속층은 구리(Cu)로 이루어진다.